METHOD OF DETERMINATION OF OPTICAL PARAMETERS OF THIN POROUS FILMS

摘要

the invention u043eu0442u043du043eu0441u0438u0442u0441u00a0 to processing technology of materials and u043du0430u043du0435u0441u0435u043du0438u00a0 coatings and may be used in optical and electronic instrument manufacture. the purpose of u0438u0437u043eu0431u0440u0435u0442u0435u043du0438u00a0 is the broadening of the range of object, improving the accuracy and definition of the u043fu043eu043au0430u0437u0430u0442u0435u043bu00a0 u043fu0440u0435u043bu043eu043cu043bu0435u043du0438u00a0 material film.this film u043du0430u043du043eu0441u00a0u0442 u0434u043bu00a0 real substrate wa u043au0443u0443u043cu0438u0440u0443u044eu0442, u0438u0437u043cu0435u0440u00a0u044eu0442 parameters u043fu043eu043bu00a0u0440u0438u0437u0430u0446u0438u0438 reflected u0438u0437u043bu0443u0447u0435u043du0438u00a0, which u043eu043fu0440u0435u0434u0435u043bu00a0u044eu0442 effective u043fu043eu043au0430u0437u0430u0442u0435u043b it u043fu0440u0435u043bu043eu043cu043bu0435u043du0438u00a0,after u0437u0430u043fu043eu043bu043du0435u043du0438u00a0 since u0441u043au043eu043du0434u0435u043du0441u0438u0440u043eu0432u0430u043du043du044bu043c gaseous substance again u0438u0437u043cu0435u0440u00a0u044eu0442 parameters u043fu043eu043bu00a0u0440u0438u0437u0430u0446u0438u0438 and u043eu043fu0440u0435u0434u0435u043bu00a0u044eu0442 effective rate and then u043fu0440u0435u043bu043eu043cu043bu0435u043du0438u00a0 u0437u043du0430u0447u0435u043du0438u00a0u043c indicators u043fu0440u0435u043bu043eu043cu043bu0435u043du0438u00a0 in vacuum and in u0443u0441u043bu043eu0432u0438u00a0u0445 condensation u043eu043fu0440u0435u0434u0435u043bu00a0u044eu0442 porosity and the rate of u043fu0440u0435u043bu043eu043cu043bu0435u043du0438u00a0 material film. 1, table 2).