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REMOVING METHOD FOR ORGANIC FILM OF ORGANIC PHOTOSENSITIVE BODY, AND REGENERATED BASE BODY FOR ORGANIC PHOTOSENSITIVE BODY
REMOVING METHOD FOR ORGANIC FILM OF ORGANIC PHOTOSENSITIVE BODY, AND REGENERATED BASE BODY FOR ORGANIC PHOTOSENSITIVE BODY
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机译:有机感光体的有机膜的去除方法以及有机感光体的再生基体
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摘要
PURPOSE: To efficiently regenerate an org. photosensitive body by removing an org. film of an org. photosensitive material formed on the base body with using a treating liquid containing carboxylic acid, phenol compd. and ketone compd. ;CONSTITUTION: An an org. photosensitive film formed on a base body is treated with a treating liquid containing carboxylic acid, phenol compd. and ketone compd. With this treating liquid, not only the org. film but an inorg. film of the base coating layer can be removed. The carbyxylic acid used is formic acid, acetic acid propionic acid, or butylic acid. The phenol compd. swells the org. film, and phenol, cresol, or xylenol is used for it. The ketone compd. also swells the org. film, and acetone, methylethylketone, diethylketone, or cyclohexanone is used for it.;COPYRIGHT: (C)1993,JPO&Japio
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