首页> 外国专利> Flash EEPROM preventing excessive erasure - injects electrons into floating gate of memory cells during erasure and extracts electrons during programming to force cells to enhancement level determined by set voltage

Flash EEPROM preventing excessive erasure - injects electrons into floating gate of memory cells during erasure and extracts electrons during programming to force cells to enhancement level determined by set voltage

机译:闪存EEPROM防止过度擦除-在擦除期间将电子注入存储单元的浮置栅极中,并在编程过程中提取电子以迫使单元达到由设定电压确定的增强电平

摘要

A source line is common to the memory cells, with each cell fitted with a control gate (1006) coupled to a word line. A drain (1002) is coupled to a corresp. bit line, while a source (1003) is linked to the source line. An electron injection gun simultaneously applies electrons to floating gates of several memory cells during erasing to force the memory cells into an enrichment mode with the cells defined by a first threshold voltage. An electron extraction acts on a selected floating gate for programming to force its cell into a second enrichment, under definition by a second threshold voltage. ADVANTAGE - Reliable and more rapid operation for both programming and erasing.
机译:源极线对于存储单元是公共的,每个单元装配有耦合到字线的控制栅(1006)。漏极(1002)耦合到相应的。位线,而源(1003)链接到源线。电子注入枪在擦除期间同时将电子施加到几个存储单元的浮置栅极,以迫使存储单元进入由第一阈值电压限定的单元的富集模式。电子提取作用在选定的浮栅上,以进行编程以迫使其单元进入第二富集状态,在第二阈值电压的作用下。优点-编程和擦除操作可靠,更快速。

著录项

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号