Substrate creation manner null of plate-like information record

摘要

PURPOSE:To form easily grooves and pit arrays different in depth on the same substrate by providing a mask having aperture parts different in width on the substrate and allowing a gas in the plasma state to act upon this substrate. CONSTITUTION:A photoresist 2 is applied onto a glass substrate 1 and is exposed to light while changing the spot diameter of a laser light 3 to form a mask pattern having aperture part different in width. This glass substrate 1 is placed on the cathode electrode of a dry etching device, and CHF3 is used as the etching gas to allow the gas in the plasma state to act upon the substrate by discharge. If the discharging power of plasma generation, the action time of plasma, etc. are selected properly at this time, etching different in depth is performed in accordance with aperture parts of the mask. Thus, grooves and pit arrays different in depth are formed easily on the same substrate 1.