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FORMATION METHOD FOR MERCURY CADMIUM TELLURIUM THIN FILM BASED ON MOLECULAR BEAM AND SUBSTRATE HOLDER THEREOF

机译:基于分子束及其基体的汞碲薄膜的形成方法

摘要

PURPOSE: To prevent temperature drop caused by changes in substrate temperature during the growth of an HgCdTe thin film and enhance crystal properties by loading the substrate on the surface of a susceptor formed with a carbonic raw material of a substrate holder and forming the HgCdTe film. ;CONSTITUTION: The surface of a susceptor 12 of a substrate holder 1 is formed with a carbonic raw material having a high thermal emissivity. A substrate 3 is loaded on the surface of the susceptor 12. A mercury cadmium tellurium (HgCdTe) thin film is formed on the substrate 3 by a molecular epitaxial method (MBE). A thermocouple 6 is loaded near the susceptor in such a fashion that it may not come into contact with the surface of the susceptor 12 of the substrate holder 1 and the substrate holder 1 is rotated, thereby making an MBE growth. Therefore, thermal radiation diffusion takes place to a satisfactory extent which is equivalent to the HgCdTe thin film having a high thermal emissivity deposited on the substrate, which has lowered the temperature in the substrate and produced a stabilized state already.;COPYRIGHT: (C)1994,JPO&Japio
机译:目的:为防止在HgCdTe薄膜的生长过程中因基板温度变化而引起的温度下降,并通过将基板加载到由基板支架的含碳原料形成的基座表面并形成HgCdTe膜来增强晶体性能。 ;组成:基板支架1的基座12的表面由具有高热发射率的碳原料形成。将基板3装载在基座12的表面上。通过分子外延法(MBE)在基板3上形成汞镉碲(HgCdTe)薄膜。热电偶6以不与基板支架1的基座12的表面接触并且基板支架1旋转的方式装载在基座附近,从而使MBE生长。因此,热辐射的扩散程度达到了令人满意的程度,相当于在基板上沉积了具有高热发射率的HgCdTe薄膜,这已经降低了基板中的温度并已经形成稳定状态。;版权所有:(C) 1994,日本特许厅

著录项

  • 公开/公告号JPH06177038A

    专利类型

  • 公开/公告日1994-06-24

    原文格式PDF

  • 申请/专利权人 NEC CORP;

    申请/专利号JP19920329049

  • 发明设计人 SASAKI NARIHITO;

    申请日1992-12-09

  • 分类号H01L21/203;C30B23/08;C30B29/48;

  • 国家 JP

  • 入库时间 2022-08-22 04:49:54

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