SUBSTRATE HOLDER FOR MERCURY CADMIUM TELLURIUM THIN FILM OF MOLECULAR BEAM EPITAXY DEVICE

摘要

PURPOSE: To prevent the dropping of a substrate temp. at the time of growing the thin film and to obtain the thin film having high crystallinity and uniformity by coating a substrate holder with a carbon film. ;CONSTITUTION: The carbon film 4 having a large coefft. of absorption is formed by a method, such as vacuum vapor deposition method, on a substrate holder 1 for forming the HgCdTe thin film of a molecular epitaxy device. The substrate for deposition of HgCdTe, for example, a substrate 2 consisting of molybdenum, is fixed by a metal 3 of a low m.p. to this holder and the HgCdTe thin film is deposited on the substrate 2. As a result, the substrate temp. is extremely stabilized during the growth of the thin film and the HgCdTe thin film having the high uniformity and the good-quality crystallinity is formed. Gallium may be applied on the substrate holder made of the molybdenum in place of the carbon film 4 and this holder may be subjected to a heating treatment in a vacuum to coat the holder surface with the compd. of the gallium and molybdenum.;COPYRIGHT: (C)1993,JPO&Japio