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Non-volatile semiconductor memory device having oxynitride film for preventing charge in floating gate from loss

机译:具有用于防止浮栅中的电荷损失的氮氧化物膜的非易失性半导体存储器件

摘要

An electrically programmable read only memory device store data bits in the form of electric charges accumulated in floating gate electrodes of the memory cells, and a spin-on glass film is incorporated in an inter- level insulating film structure over the memory cells so as to create a smooth surface for wirings, wherein a silicon oxynitride film is inserted between the floating gate electrodes and the spin-on-glass film for preventing the accumulated electric charges from undesirable ion- containing water diffused from the spin-on-glass film.
机译:电可编程只读存储器件以电荷形式存储在存储单元的浮置栅电极中的数据位,并且在存储单元上方的层间绝缘膜结构中并入了旋涂玻璃膜,以便产生用于布线的光滑表面,其中在浮动栅电极和旋涂玻璃膜之间插入氮氧化硅膜,以防止从旋涂玻璃膜扩散的不希望有的含离子水累积电荷。

著录项

  • 公开/公告号US5306936A

    专利类型

  • 公开/公告日1994-04-26

    原文格式PDF

  • 申请/专利权人 NEC CORPORATION;

    申请/专利号US19930102269

  • 发明设计人 YOSHIRO GOTO;

    申请日1993-08-05

  • 分类号H01L29/68;H01L29/78;H01L29/34;

  • 国家 US

  • 入库时间 2022-08-22 04:31:50

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