DEVICE FOR FORMING FILM BY SPUTTERING WITH HIGH-VELOCITY ATOM BEAM AND PRODUCTION OF FUNCTIONALLY GRADIENT THIN FILM

摘要

PURPOSE: To provide a device capable of producing functionally gradient thin films which are easily realizable, are low in production costs, facilitate utilization of insulator targets and allow free selection of the combinations of compsns. and a method for film formation using this device. ;CONSTITUTION: This device is constituted to form the films by irradiating the targets with high-velocity atom beams in a vacuum and depositing the sputtered particles released from these targets on a substrate. The device described above is provided with plural high-velocity atom beam generating sources 25, 27, is arranged with the targets 33, 35 on the cources of the high-velocity atom beams 26, 28 generated from the respective high-velocity atom beam generating sources 25, 27 respectively and is arranged with the substrate 13 to be deposited with the sputtered particles 34, 36 released from the plural targets 33, 35. The respective high-velocity atom beam generating sources 25, 27 are provided with the plural shutter mechanisms 31, 32 which can independently shut off the respective high-velocity atom beams near the ports of these sources where the high-velocity atom beams 26, 28 are generated. These shutter mechanisms 31, 32 are capable of making frequent and rapid opening and closing actions.;COPYRIGHT: (C)1995,JPO