HARD CARBON FILM, HARD CARBON FILM-COATED MEMBER AND FORMING METHOD OF HARD CARBON FILM

摘要

PURPOSE: To obtain a hard carbon film having smoothness, high wear resistance and high sliding property by forming the film in such a manner that the intensity ratios of peaks in the X-ray diffraction analysis of diamond satisfy specified relations. ;CONSTITUTION: A silicon wafer is disposed as the base material 2 in a reactive furnace in an ECR plasma device. Microwaves are generated from a microwave generating device 3, while methane gas or the like is introduced through a gas inlet 5 to form a film on the base material 2. A hard carbon film containing diamond is produced. The X-ray diffraction analysis of the diamond in the film shows such relations of peak intensities as 1≤1b/1a≤10, 2≤1b/1c, 2≤1b/1d, wherein 1a, 1b, 1c, 1d are peak intensities for (111), (220), (311), (400), respectively. The film has 50-700W/(m-k) thermal conductivity and 3.20 to 3.45g/cm³ density.;COPYRIGHT: (C)1995,JPO