首页> 外国专利> LOW-VOLTAGE ERASABLE SPLIT-GATE FLASH PROGRAMMABLE READ ONLY MEMORY CELL AND ARRAY

LOW-VOLTAGE ERASABLE SPLIT-GATE FLASH PROGRAMMABLE READ ONLY MEMORY CELL AND ARRAY

机译:低电压可擦除分割门闪存,可编程只读存储单元和阵列

摘要

PURPOSE: To enable erasure at a low voltage by providing a control gate having a portion serially provided between a program portion of a floating gate and a source, and providing the floating gate with an erasure portion extending from the program portion around a channel end portion to the source. ;CONSTITUTION: An erasure portion 34b of a floating gate 34 extends to a position around the lower end of a channel 22 on a field oxide insulating member 16, and overlaps with a source 18. A polysilicon control gate 38 has a split structure including a first portion 38a overlapping with the floating gate 34 and a program region 22a of the channel 22. A second portion 38b overlaps with a gap region of the channel 22, and is serially provided between the program portion 34a of the floating gate 34 and the source 18. The erasion is performed at a low voltage by causing Fowler Nordheim tunnel effect from an end portion 34c of the erasion portion 34b of the floating gate 34 through a lower tunnel oxide layer 32 to the source 18.;COPYRIGHT: (C)1995,JPO
机译:目的:通过提供控制栅,该控制栅具有串联地设置在浮栅的编程部分和源极之间的部分,并为浮栅提供从编程部分围绕沟道端部延伸的擦除部分,以实现低电压擦除。到源头。 ;组成:浮栅34的擦除部分34b延伸到场氧化物绝缘构件16上的沟道22的下端附近的位置,并且与源极18重叠。多晶硅控制栅38具有包括结构的分离结构。第一部分38a与浮置栅极34和沟道22的编程区域22a交叠。第二部分38b与沟道22的间隙区域交叠,并且第二部分38b串联设置在浮栅34的编程部分34a和源极之间。 18.通过在低电压下进行擦除来引起福勒·诺德海姆隧道效应,该效应从浮置栅极34的擦除部分34b的端部34c穿过下隧道氧化物层32到达源极18。版权所有:(C)1995 ,日本特许厅

著录项

  • 公开/公告号JPH0750350A

    专利类型

  • 公开/公告日1995-02-21

    原文格式PDF

  • 申请/专利权人 HUGHES AIRCRAFT CO;

    申请/专利号JP19940077635

  • 发明设计人 CHANG CHEN-CHI P;LI MEI F;

    申请日1994-04-15

  • 分类号H01L21/8247;H01L29/788;H01L29/792;

  • 国家 JP

  • 入库时间 2022-08-22 04:23:34

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