首页> 外国专利> X-RAY TOPOGRAPHY DEVICE BY DOUBLE CRYSTAL METHOD AND X-RAY DIFFRACTION PHOTOGRAPHY USING X-RAY TOPOGRAPHY DEVICE

X-RAY TOPOGRAPHY DEVICE BY DOUBLE CRYSTAL METHOD AND X-RAY DIFFRACTION PHOTOGRAPHY USING X-RAY TOPOGRAPHY DEVICE

机译:双晶体X射线断层摄影设备以及使用X射线断层摄影设备的X射线衍射摄影

摘要

PURPOSE: To provide an X-ray topography device according to the double crystal method which can measure the crystal state of the entire surface of a sample with warpage and curvature, etc., of a crystal lattice surface. ;CONSTITUTION: In an X-ray topography device 1 by the double crystal method which causes a bundle of wide X rays from an X-ray source 2 to be diffracted by a single crystal 3, wide diffraction rays from the single crystal 3 to enter each measuring position of a crystal 4 as a sample, the diffraction rays from each measuring position of the crystal 4 to be shot by an image pick-up means 7, and the crystal state of the crystal 4 to be measured, a diffraction condition setting means 10 for satisfying the Bragg's diffraction conditions is provided at each incidence position of the diffraction rays for the crystal 4. This configuration achieves a purpose.;COPYRIGHT: (C)1994,JPO
机译:用途:提供一种根据双晶方法的X射线形貌装置,该装置可以测量样品的整个表面的晶体状态,并且具有晶格表面的翘曲和曲率等。 ;组成:在通过双晶法的X射线形貌装置1中,来自X射线源2的一束宽X射线被单晶3衍射,来自单晶3的宽衍射光进入作为样本的晶体4的每个测量位置,由图像拾取装置7拍摄的来自晶体4的每个测量位置的衍射射线,以及要测量的晶体4的晶体状态,衍射条件设定在晶体4的衍射线的各入射位置上设有用于满足布拉格的衍射条件的单元10。该结构达到目的。(版权):( C)1994,JPO

著录项

  • 公开/公告号JPH06331573A

    专利类型

  • 公开/公告日1994-12-02

    原文格式PDF

  • 申请/专利权人 TDK CORP;

    申请/专利号JP19930145563

  • 申请日1993-05-25

  • 分类号G01N23/207;

  • 国家 JP

  • 入库时间 2022-08-22 04:21:19

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