the invention relates to a hollow anode glow discharge device in the form of two - and three electrode reactor for the deposition and etching, and for effective treatment of substrates with a uniform low pressure. timetable.in a first embodiment, the ionic processes, the apparatus of the invention consists of a grid of uniform density, high capacity (90) having perforations (92, 94) of multiple sizes, regularly spaced.in a second embodiment, the dominant processes for chemicals, the device consists of a grid of uniform density, high capacity with regularly spaced perforations and a multi phased plan profile changes or not.in a third embodiment, the dominant processes and / or ionic chemical at low pressure, the device consists of a grid of holes, high capacity density, with multiple equally spaced large enough to offset the effects of the. ace dark.in a fourth embodiment, designed for the dominant processes, ionic and / or chemical, the apparatus comprises a source of a high capacity density working synergistically with a punched grid to provide the selected ions at energy densities.
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