Semiconductor device having a wiring pattern in which a plurality of lines are arranged in close proximity to one another

摘要

Three first patterned lines (1, 1, 1) made of aluminum extend in one direction on an insulation layer and are arranged at minimum intervals λ1 according to the design rules. End portions of the first patterned lines (1, 1, 1) are connected to those of three second patterned lines (2, 2, 2) made of aluminum extending along a line perpendicular to the first patterned lines (1, 1, 1). The second patterned lines (2, 2, 2) are arranged at intervals λ2, which are wider than the minimum interval λ1. All of the lines (1, 1, 1 and 2, 2, 2) have the minimum width according to the design rules.