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Method for forming a plasma-surface-modified composite coating layer on a stellite material

机译:在stellite材料上形成等离子体表面改性的复合涂层的方法

摘要

The present invention relates to a method of forming a coating layer having excellent abrasion resistance on a stellite material used for maintenance and spur gears, sleeves, valves, bushing materials, and the like. The surface of the stellite material is subjected to plasma diffusion treatment ) To form a diffusion layer (nitrided layer) deeply and then continuously forming a TiN film by a plasma chemical vapor deposition process to form a compound coating or a diffusion-only surface modification layer thickness (Scratches) and abrasion of the wearer, which is an object of the present invention.;The present invention relates to a method for forming a coating layer on a stellite material, the method comprising plasma nitriding the stellite material at a temperature in the range of 517 to 733C to produce CrN and Cr2N mixed coating layer was formed, and then a Ti source: TiCl4Solution N Source: N2Gas, Plasma Source: H2And Ar gas, a substrate temperature of 550 to 800C, and an applied voltage of 525 V or more to form a plasma surface modified composite coating layer on the stellite material.
机译:本发明涉及在用于维护和正齿轮,套筒,阀,衬套材料等的星状材料上形成具有优异耐磨性的涂层的方法。对司太立材料的表面进行等离子扩散处理)以形成深层扩散层(氮化层),然后通过等离子化学气相沉积工艺连续形成TiN膜,以形成化合物涂层或仅扩散表面改性层本发明的目的是使佩戴者的厚度(划痕)和磨损发生磨损。本发明涉及一种在星状材料上形成涂层的方法,该方法包括在
硅藻土的温度下等离子氮化该星状材料。在517至733C范围内生成CrN和Cr 2 N混合涂层,然后生成Ti源:TiCl 4 溶液N源:N 2 < / Sub> Gas,等离子体源:H 2 和Ar气体,基板温度为550至800C,施加的电压为525 V或更高,以在星状体上形成等离子体表面改性的复合涂层材料。

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