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Wafer developer with wafer contamination prevention device

机译:具有晶片污染防止装置的晶片显影剂

摘要

In this case, the photo phenomenon in semiconductor component manufacturing engineering is fairAccording to the current situation, the service buffer phenomenon of the service pollution prevention device to prevent the service rear pollution.In order to prevent the phenomenon liquid flowing from the bottom of the rotating ruler from flowing into the inside of the rotating ruler, a current guard cleaning phenomenon liquid (guard) is provided at the periphery of the rotating ruler to eliminate the pollution on the back of the suspension and maintain the cleanliness of the semiconductor molding engineering. It can not only improve the reliability of processing engineering, but also improve the production water rate.
机译:在这种情况下,半导体元件制造工程中的光现象是合理的,根据目前的情况,使用防止污染装置的使用缓冲现象来防止使用后污染,以防止液体从旋转的底部流出。尺子不流入尺子的内部,在尺子的周围设有电流保护清洁现象液(保护剂),以消除悬架背面的污染,并保持半导体成型技术的清洁度。它不仅可以提高加工工程的可靠性,而且可以提高生产用水率。

著录项

  • 公开/公告号KR960025265U

    专利类型

  • 公开/公告日1996-07-22

    原文格式PDF

  • 申请/专利权人 대표이사 김주용;

    申请/专利号KR19940039620U

  • 发明设计人 박기엽;

    申请日1994-12-31

  • 分类号H01L21/02;

  • 国家 KR

  • 入库时间 2022-08-22 03:44:48

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