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Local thinning of channel region for ultra-thin film SOI MOSFET with elevated source/drain
Local thinning of channel region for ultra-thin film SOI MOSFET with elevated source/drain
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机译:源/漏提高的超薄膜SOI MOSFET的沟道区域局部变薄
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摘要
An elevated source/drain structure is described in which the channel region is thinned by local oxidation and wet etch while the source/drain region remained thick. This structure achieves source/drain resistances as small as 300 ohm-&mgr;m for NMOS, which makes possible high drive currents in deep submicron thin-film SOI/MOSFET.
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