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STABILITY IMPROVE MINORITY CARRIER SEMICONDUCTOR DEVICE AND ITS IMPROVING METHOD

机译:稳定性提高的少数载流子半导体器件及其改进方法

摘要

PROBLEM TO BE SOLVED: To improve the operational stability of a light-emitting semiconductor device by a method wherein a region, where impurities are doped from the group of deep level impurities reactive impurities and shallow compensating impurities, is provided adjacent to an active region. ;SOLUTION: In the case of a III-V group semiconductor material, O can be turned into impurities of a deep level, reactive impurities, with which guttering or passivation can be provided, and shallow compensating impurities. In the case of the LED of (AlxGa1-x)0.5In0.5P, its reliability can be enhanced by feeding O into a P-type confinement layer 14 in a controllable manner by making the best use of the doping source of O. When O in the density of at least from 1×1016 cm-3 to 5×1019 cm-3 is provided to the P-type confinement layer 14, the stability of a semiconductor element can be improved. The operational stability of the best light-emitting semiconductor element can be improved, when a doping of about 1×1018 cm-3 in density is provided to the P-type confinement layer 14.;COPYRIGHT: (C)1996,JPO
机译:要解决的问题:通过一种方法来改善发光半导体器件的操作稳定性,其中在有源区附近设置从深层杂质,反应性杂质和浅补偿性杂质的组中掺杂杂质的区域。 ;解决方案:在III-V类半导体材料的情况下,O可以变成深层杂质,可以提供沟槽或钝化的反应性杂质以及浅补偿杂质。对于(Al x Ga 1-x 0.5 In 0.5 P的LED,其可靠性可以通过充分利用O的掺杂源以可控的方式将O馈入P型限制层14中来增强。当O的密度至少为1×10 16 时向P型限制层14设置cm -3 至5×10 19 cm -3 ,可以使半导体元件的稳定性高。有待改进。当向P型掺杂密度约为1×10 18 cm -3 的掺杂时,可以改善最佳发光半导体元件的操作稳定性。限制层14 .;版权:(C)1996,日本特许厅

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