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WAFER DRIER

机译:威发

摘要

PROBLEM TO BE SOLVED: To provide a drier which can prevent the occurrence of particles brought into existence by the dry process executed in one chamber. ;SOLUTION: Steam generation process is executed by providing the first chamber 20 for generation of IPA(isopropyl alcohol) vapor and the second chamber 40 for drying separately, and supplying IPA solution 21 from a supply line 22 into the first chamber 20, and heating it with a heater 22 to generate IPA vapor in the first chamber 20. Then, the dry process is executed by supplying IPA vapor into the second chamber 40 through an IPA feeder 30, when the IPA vapor pressure within the first chamber 20 comes to appropriate pressure, and performing the drying of the wafer 45 accommodated in the second chamber 40 by the IPA vapor supplied from the first chamber 20.;COPYRIGHT: (C)1997,JPO
机译:解决的问题:提供一种干燥机,该干燥机可以防止在一个腔室中进行的干燥过程中产生的颗粒的出现。 ;解决方案:通过分别提供用于产生IPA(异丙醇)蒸气的第一腔室20和用于干燥的第二腔室40,并将IPA溶液21从供应管线22供应到第一腔室20中并进行加热来执行蒸汽产生过程通过加热器22在第一腔室20中产生IPA蒸汽,然后在第一腔室20内的IPA蒸汽压力达到适当时,通过IPA进料器30将IPA蒸汽供应到第二腔室40中来执行干燥过程。压力,并通过从第一腔室20供应的IPA蒸气对容纳在第二腔室40中的晶片45进行干燥。版权所有:(C)1997,JPO

著录项

  • 公开/公告号JPH09190997A

    专利类型

  • 公开/公告日1997-07-22

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRON CO LTD;

    申请/专利号JP19960321888

  • 发明设计人 NAN SHOKEN;KO YONSUN;

    申请日1996-12-02

  • 分类号H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-22 03:34:26

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