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Resistor formation formation manner and metal organic matter resistor film null to insulating substrate
Resistor formation formation manner and metal organic matter resistor film null to insulating substrate
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机译:电阻器的形成方式以及金属有机物电阻器膜相对于绝缘基板为零的情况
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摘要
PURPOSE:To form a resistor layer having a uniform thickness on an insulating base surface by attaching with pressure a metallo-organic resistor layer of a metallo-organic resistor film on the insulating base surface. CONSTITUTION:A metallo-organic resistor film F cut into a proper size is arranged such that its metallo-organic resistor layer 22' contacts with the surface of an insulating base 2. The metallo-organic resistor film F is pressed on the surface of the insulating base 2 by a heater head 24 heated to about 120 deg.C. At this time, the metallo-organic resistor layer 22' of the metallo-organic resistor film F is softened slightly and attached with pressure on the surface of the insulating base 2. When the insulating base 2 having the metallo-organic resistor film F attached thereto is baked in an infrared kiln with a peak temperature 800 deg.C for about 10 minutes, a film body 21 of the metallo-organic resistor film F burns off in the kiln so that a resistor layer 3L will be formed on the surface of the insulating base 2.
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