ORGANIC CHLORIDES SHOWING A REDUCED EFFECT UPON THE DESTRUCTION OF THE OZONE LAYER FOR USE DURING SILICON THERMAL OXIDATION AND FURNACE TUBE CLEANING

摘要

A process for thermal oxidation of silicon or cleaning of furnace tubes used in semiconductor manufacturing by exposing the silicon or tube to temperatures above 700 DEG C while flowing a carrier gas containing oxygen and a chlorohydrocarbon having a general formula CxHxClx where x is 2, 3, or 4 over the silicon or tube. The chlorohydrocarbon is selected to readily and completely oxidize at temperature.