首页> 外国专利> A method of etching an aperture / slit of a cathode ray tube shadow mask and a shadow mask manufactured by the method

A method of etching an aperture / slit of a cathode ray tube shadow mask and a shadow mask manufactured by the method

机译:蚀刻阴极射线管荫罩的开口/缝隙的方法以及由该方法制造的荫罩

摘要

The present invention relates to a method of etching an aperture / slit of a shadow mask used in a cathode ray tube and a shadow mask for a cathode ray tube manufactured by the method.;A shadow mask for a color cathode ray tube comprising an effective portion formed with an electron beam passage hole and an ineffective portion formed with no electron beam passage hole, wherein the electron beam passage hole formed in the effective portion is formed to conform to the incident angle of the electron beam scanned by the electron gun A shadow mask for a cathode ray tube and a manufacturing method for manufacturing the shadow mask are provided.;Since the shadow mask electron beam passing hole according to the present invention is formed so as to coincide with the incident angle of the electron beam, the phosphor stripe is sufficiently emitted to improve the luminance and color purity of the cathode ray tube, and the electron beam scanned from the electron gun significantly collides with the shadow mask, There is an effect that the problem of thermal deformation of the shadow mask does not occur at the time of use.
机译:本发明涉及一种蚀刻在阴极射线管中使用的荫罩的开口/缝隙的方法和由该方法制造的用于阴极射线管的荫罩。彩色阴极射线管的荫罩包括有效的形成有电子束通过孔的部分和没有电子束通过孔的无效部分,其中形成在有效部分中的电子束通过孔形成为与由电子枪扫描的电子束的入射角一致提供一种用于阴极射线管的荫罩及其制造方法。由于形成了与电子束的入射角一致的本发明的荫罩电子束通过孔,因此荧光体条纹电子束被充分发射以改善阴极射线管的亮度和色纯度,并且从电子枪扫描的电子束显着碰撞到阴极射线管。荫罩,具有在使用时不会发生荫罩的热变形问题的效果。

著录项

  • 公开/公告号KR970030151A

    专利类型

  • 公开/公告日1997-06-26

    原文格式PDF

  • 申请/专利权人 엄길용;

    申请/专利号KR19950041572

  • 发明设计人 박영호;

    申请日1995-11-16

  • 分类号H01J29/32;

  • 国家 KR

  • 入库时间 2022-08-22 03:17:30

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