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A method of etching an aperture / slit of a cathode ray tube shadow mask and a shadow mask manufactured by the method
A method of etching an aperture / slit of a cathode ray tube shadow mask and a shadow mask manufactured by the method
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机译:蚀刻阴极射线管荫罩的开口/缝隙的方法以及由该方法制造的荫罩
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摘要
The present invention relates to a method of etching an aperture / slit of a shadow mask used in a cathode ray tube and a shadow mask for a cathode ray tube manufactured by the method.;A shadow mask for a color cathode ray tube comprising an effective portion formed with an electron beam passage hole and an ineffective portion formed with no electron beam passage hole, wherein the electron beam passage hole formed in the effective portion is formed to conform to the incident angle of the electron beam scanned by the electron gun A shadow mask for a cathode ray tube and a manufacturing method for manufacturing the shadow mask are provided.;Since the shadow mask electron beam passing hole according to the present invention is formed so as to coincide with the incident angle of the electron beam, the phosphor stripe is sufficiently emitted to improve the luminance and color purity of the cathode ray tube, and the electron beam scanned from the electron gun significantly collides with the shadow mask, There is an effect that the problem of thermal deformation of the shadow mask does not occur at the time of use.
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