首页> 外国专利> VERTICAL CAVITY LASER EMISSION COMPONENT WITH SURFACE EMISSION AT A WAVELENGTH BETWEEN 1.3 AND 1.5 MU M AND METHOD FOR THE PRODUCTION THEREOF

VERTICAL CAVITY LASER EMISSION COMPONENT WITH SURFACE EMISSION AT A WAVELENGTH BETWEEN 1.3 AND 1.5 MU M AND METHOD FOR THE PRODUCTION THEREOF

机译:垂直腔激光与表面发射波长在1.3和1.5毫米之间的激光发射组件及其制造方法

摘要

P Laser emission component with vertical cavity emitting by the surface at a wavelength between 1.3 and 1.55 mum, comprising a stack having two mirrors (2, 6) which reflect the length of emission wave and one or more layers (4) which are interposed between these two mirrors (2, 6) and which constitute an amplifying medium for the emitted radiation, characterized in that at least one (2) of these mirrors present in the vicinity of the amplifying medium (4) a layer (2a) of Alx Ga1-x As, with x between 0.8 and 1, selectively oxidized (2ai and 2aii) around an active central zone of the amplifying medium (4). BR/ In the production method, two samples are grown by epitaxy, one on an InP substrate, the other on a GaAs substrate and the two samples thus obtained are assembled by epitaxial bonding. of a layer of GaAs of the second sample on a layer of InP of the first, the sample thus obtained is both etched and then oxidized by hydrolysis. /P
机译:

具有垂直腔的激光发射组件,该组件通过表面以1.3到1.55μm的波长发射,包括一个具有两个反射镜(2、6)和一个或多个层(4)的叠层,两个反射镜反射发射波的长度介于这两个反射镜(2、6)之间,它们构成用于发射辐射的放大介质,其特征在于,这些反射镜中的至少一个(2)在放大介质(4)附近存在一层(2a) Alx Ga1-x As,x在0.8到1之间,在放大介质(4)的活动中心区域周围被选择性氧化(2ai和2aii)。
在该制造方法中,通过外延生长两个样品,一个在InP衬底上,另一个在GaAs衬底上,并且由此获得的两个样品通过外延键合组装。在第一样品的InP层上的第二样品的GaAs层中,如此获得的样品被蚀刻,然后通过水解氧化。

著录项

  • 公开/公告号FR2739230A1

    专利类型

  • 公开/公告日1997-03-28

    原文格式PDF

  • 申请/专利权人 JEAN LOUIS OUDAR;

    申请/专利号FR19950011158

  • 发明设计人 JEAN LOUIS OUDAR;

    申请日1995-09-22

  • 分类号H01S3/06;

  • 国家 FR

  • 入库时间 2022-08-22 03:12:13

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