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Polycrystalline silicon-based substrate for liquid jet recording head, process for producing said substrate, liquid jet recording head in which said substrate is used, and liquid jet recording apparatus in which said substrate is used
Polycrystalline silicon-based substrate for liquid jet recording head, process for producing said substrate, liquid jet recording head in which said substrate is used, and liquid jet recording apparatus in which said substrate is used
A substrate for liquid jet recording head including an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, characterized in that said substrate includes a base member constituted by a polycrystalline material such as a polycrystalline silicon material or the like, a process for producing this substrate, a liquid jet recording head in which said substrate, and a liquid jet recording apparatus in which said recording head is used. PPA desirable recording head which is free of a warpage or a curved portion and which provides a high quality recorded image can be produced by using said base member. Further, a desirable recording apparatus which enables to record a high quality image at a high recording speed. In the process of producing said substrate, the surface of the polycrystalline base member is thermally oxidized to provide a surface excelling in flatness.
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