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CRYSTAL GROWTH METHOD FOR THIN FILM OF MULTIPLE OXIDE CONTAINING BISMUTH AS CONSTITUENT ELEMENT
CRYSTAL GROWTH METHOD FOR THIN FILM OF MULTIPLE OXIDE CONTAINING BISMUTH AS CONSTITUENT ELEMENT
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机译:含铋多氧化物组成元素薄膜的晶体生长方法
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摘要
PROBLEM TO BE SOLVED: To suppress the formation of a foreign phase and the deposition of impurities due to the deviation of Bi-containing composition from a target one and to obtain a high quality thin film of a multiple oxide contg. Bi by growing crystals by a vapor growth method while utilizing the growth self- terminating action of Bi. ;SOLUTION: Growth temp. and the amt. of oxidizing gas are set so as not to form Bi oxide but to form the objective multiple oxide, Bi is fed in excess more than other elements in the crystal growing environment to prevent a shortage of Bi and crystals are grown by a vapor growth method while utilizing the growth self-terminating action of Bi by which excess Bi is evaporated from a formed thin film. The multiple oxide is preferably Bi2Sr2CuO6, Bi4Ti3O12, Bi2WO6 or Bi2SrTa2O9. The vapor growth method is e.g. a molecular beam epitaxial method, a laser beam ablation method, a sputtering method or a chemical vapor growth method.;COPYRIGHT: (C)1998,JPO
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机译:解决的问题:抑制由于含Bi的组成偏离目标物而引起的异相的形成和杂质的沉积,并获得高质量的由多种氧化物构成的薄膜。通过利用Bi的生长自终止作用,通过气相生长法生长晶体来形成Bi。 ;解决方案:生长温度。和amt。设置一定的氧化气体使其不形成Bi氧化物而是形成目标多氧化物,在晶体生长环境中,Bi的添加量要比其他元素过量,以防止Bi的短缺,并且通过气相生长法生长晶体利用Bi的生长自终止作用,通过过量的Bi从形成的薄膜中蒸发出来。多元氧化物优选为Bi 2 Sub> Sr 2 Sub> CuO 6 Sub>,Bi 4 Sub> Ti 3 Sub > O 12 Sub>,Bi 2 Sub> WO 6 Sub>或Bi 2 Sub> SrTa 2 Sub> O < Sub> 9 Sub>。气相生长方法是例如。分子束外延法,激光束烧蚀法,溅射法或化学气相生长法。;版权所有:(C)1998,日本特许厅
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