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Method for crystal growth of multi-element oxide thin film containing bismuth as constituent element

机译:以铋为构成元素的多元素氧化物薄膜的晶体生长方法

摘要

A method for crystal growth of a multi-element oxide thin film containing bismuth as a constituent element has setting a growth environment to fall under conditions such that an oxide of bismuth alone will not be formed, but the desired multi-element oxide will be formed; and supplying bismuth in excess of other elements to the growth environment, to prevent the lack of bismuth and evaporate surplus bismuth from the thin film. This method suppresses the formation of different phases or the precipitation of impurities ascribed to the deviation of the proportion of bismuth element from the desired composition, enables a high quality thin film to be grown, and markedly broadens the ranges of the set conditions for the thin film growth temperature and oxidizing gas in comparison with conventional technologies.
机译:在以铋为构成元素的多元素氧化物薄膜的晶体生长方法中,将生长环境设定为不会仅形成铋的氧化物,而是形成所期望的多元素氧化物的条件。 ;并且向生长环境中提供过量的铋,以防止​​铋的缺乏并从薄膜中蒸发掉多余的铋。该方法抑制了由于铋元素的比例偏离所需组成而形成的不同相或杂质的沉淀,使得能够生长高质量的薄膜,并显着拓宽了薄的设定条件的范围。与传统技术相比,薄膜的生长温度和氧化气体。

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