Periodic multilayer deposition methods of perovskite-type multi-compound thin film

摘要

Described is a process for manufacturing thin films by periodically depositing (DEP) a number of block layers consisting of different base materials on a substrate (multilayer deposition), wherein the thickness of the layers (LT) is restricted to one to 20 monolayers and deposition as well as crystallization of the thin film is completed at approximately constant temperature without performing a seperate annealing step. The method can be used to produce thin films of high-Tc-superconductors. It allows a better control of the crystal growth of ternary or higher compounds with comparatively large unit cells. IMAGE