electron beam coating apparatus with pulse ion beam generating device and its method

摘要

this invention is a pulse shaped voltage to the anode is on the board (blank), the best in the state of sikkim, and at the same time, to prevent the anode 10 and the occurrence of high energy ion beam in accordance with the metal, oxide, compound, or low melting point glass material is close to the strength of the high light the science of the coating film is composed of the electron beam can be increased with good equipment is the type (end Hall type) pulse ion beam generating device and its related method.;this invention is a process for the coating material to the coating device for electron beam and the ion beam generating device, pulse width of the pulse signal can be generated for a pulse signal generating means and the pulse signal of the pulse type high pressure is in accordance with the voltage signal the output of the switching transistor is on, and the release of the war, to the cathode, and the emission of thermionic ionization is the Ar gas supply, in order to Ar gas supply means and the switching time of output. the uc2a4ud130 pulse type voltage connection. the signal is not the first time that the biography, to attract, and the counter ion of the ionic Ar rev up the anode composed of.in the first period, the counter ion of the Ar training culture in the board in pulse type voltage signal, the voltage is not in the second period, the release of the war, the use of the characteristics of it.