Wafer fixing device of ion implanter for semiconductor device fabrication

摘要

The present invention relates to a wafer holding apparatus for an ion implanter for semiconductor device fabrication, and more particularly, to a fixing apparatus for fixing a wafer before a wafer is processed into a desired shape by implanting ions onto the wafer, So that the ion implantation operation can be performed more stably.;To this end, a disk 3 is provided in the chamber 1 and on which the wafer 2 is placed. The transfer 3, which is provided so as to be movable up and down the outer side of the disk, seats the wafer 2 on the upper surface of the disk 3, A vacuum hose 5 connected to each of the discs 3 and the transfer arm 4 for transferring a suction force supplied from the outside to the disc 3 and the transfer arm 4, A vacuum gauge 7 connected to the vacuum hose 5 to display a suction force of the suction air passing through the vacuum hose 5, and a vacuum gauge 7 installed in the vacuum gauge, 8), the housing hose 9 is connected to one end of the vacuum hose 5 and the bail switch 8 so that the suction force transmitted from the house hood to the disk 3 and the transfer arm 4 Is displayed on the vacuum gauge 7, If the displayed value is greater than or less than the reference value, the sensor senses it, and then transmits a signal to the balancer switch 8 to control the suction force of the housebag 9 by the balancer switch.