Holder for wafer for processing in ion implantation device has base plate with recognized diameter for ion implantation device greater than diameter of wafer to be processed, fixing arrangement

摘要

The device has a base plate (1) with a recognized diameter for an ion implantation device, whereby the diameter of the base plate is greater than the diameter of the wafer to be processed, and an arrangement for fixing the wafer onto the base plate. The diameter of the base plate is identical to that of the largest wafer to be processed by an ion implantation device. AN Independent claim is also included for the following: a method of processing a wafer in an ion implantation device.