Apparatus for Chemical Vapor Deposition and Chemical Vapor Deposition (APPARATUS FOR USE WITH CVI / CVD PROCESSES)

摘要

The present invention relates to chemical vapor deposition and vapor deposition (CVI / CVD). In particular, the present invention relates to a preheater for heating a reaction gas in a CVI / CVD furnace, and a fixture for depositing a matrix in a porous structure laminate by pressure increasing CVI / CVD. The present invention is particularly suitable for simultaneous CVI / CVD processing of large quantities (hundreds) of aircraft brake disks.