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CD PLASMA CVD DEVICE FOR DLC FILM FORMATION AND FORMATION OF DLC FILM

机译:用于DLC膜形成的CD等离子CVD装置以及DLC膜的形成

摘要

PROBLEM TO BE SOLVED: To provide a DC plasma CVD device capable of forming DLC film on an insulated film and to provide a DC plasma CVD film forming method of DLC film. ;SOLUTION: As for a DC plasma CVD device 10, the inside of a reaction tube 18 is provided with a pair of cathode electrode 16 and anode electrode 20 respectively connected to a DC power source 22, and DC glow discharge is generated on the space between the electrodes to form diamondlike carbon(DLC) film on an insulated substrate. The cathode electrode 16 has an electrode face wider than the substrate face in the insulated substrate, and the anode electrode 20 has an electrode face wider than the substrate face in the insulated substrate by double or above.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:提供一种能够在绝缘膜上形成DLC膜的DC等离子体CVD装置,并提供一种DLC膜的DC等离子体CVD膜形成方法。 ;解决方案:对于DC等离子体CVD装置10,反应管18的内部设有一对分别连接到DC电源22的阴极电极16和阳极电极20,并且在该空间中产生DC辉光放电电极之间形成绝缘的衬底上的类金刚石碳(DLC)膜。阴极电极16的电极面比绝缘基板中的基板面宽,阳极电极20的电极面比绝缘基板中的基板面宽两倍或以上。版权所有:(C)1999,JPO

著录项

  • 公开/公告号JPH11140646A

    专利类型

  • 公开/公告日1999-05-25

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP19970301795

  • 发明设计人 MIYAI SEIICHI;

    申请日1997-11-04

  • 分类号C23C16/26;C30B29/04;

  • 国家 JP

  • 入库时间 2022-08-22 02:35:25

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