ALIGNING METHOD, LITHOGRAPHIC SYSTEM USING THE METHOD AND METHOD FOR MANUFACTURING DEVICE USING THE ALIGNING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a multiple aligning method, capable of obtaining image formation characteristic high respectively for a plurality of types of patterns, without causing sharp reduction in process speed even when a sensitive material necessary for shortening a deferment time of period is used. ;SOLUTION: Protective patterns 35, 36 for aligning each portion except the intrinsic patterns from reticle patterns 33R, 34R to be aligned are produced, and cyclic patterns 40, 37 are produced for prescribing a final form. Chemical amplifying type resist is first applied on a wafer of a first lot, and the protection patterns 35, 36 are aligned as patterns of a first reticle. Thereafter, the cyclic patterns 40, 37 as patterns for a second reticle with respect to a wafer of the one lot are aligned, and is developed immediately thereafter. After that, etching, etc., is performed to form circuit patterns.;COPYRIGHT: (C)1999,JPO