PHASE SHIFT PHOTOMASK BLANK AND PRODUCTION OF PHASE SHIFT PHOTOMASK AS WELL AS METHOD FOR CONTROLLING SIDE ETCHING QUANTITY

摘要

PROBLEM TO BE SOLVED: To improve the sectional shape of the phase shift films of a phase shift photomask blank composed of single layer or multiple layers of the phase shift films and phase shift photomask and to improve the line width control of circuit patterns. ;SOLUTION: The phase shift photomask blank consisting of the single layer or multiple layers of the phase shift films and phase shift photomask are produced by sputtering a molybdenum silicide target by gases consisting of inert gas and reactive gases on a transparent substrate. At this time, the gases which are formed by adding oxygen, nitrogen or a mixture composed of the oxygen and the nitrogen to a nitrogen oxide and are adjusted in the addition ratios thereof are used as the reactive gases.;COPYRIGHT: (C)1999,JPO