Method and device for the in situ stresses which develop within a thin layer when its application on a substrate measurement takes place.

摘要

THIS IS INVOLVED IN SITU IN A treatment chamber (11) a collective support (12) having a plurality of locations (14) intended to receive the substrates to be treated using a device comprising a test sample (16 ), a light source (35), who runs a BEAM ON THIS SAMPLE TEST (16), and a detector (18) on which is forwarded the beam reflected by it. According to the invention, the test sample (16) is arranged on a single support (20), WHICH IS SUSCEPTIBLE TO BE RECEIVED IN ONE OF THE SPACE (14) COLLECTIVE support (12), and leads also JOINTLY, INTRODUCTORY PART (21), at least, the detector (18). APPLICATION, PARTICULARLY IN THE TREATMENT antiglare spectacle lenses.