首页> 外国专利> Method and device for in situ measurement of the stresses developing within a thin layer when it is deposited on a substrate.

Method and device for in situ measurement of the stresses developing within a thin layer when it is deposited on a substrate.

机译:当薄层沉积在基板上时,用于原位测量在薄层内产生的应力的方法和装置。

摘要

A device for use in a processing chamber (11) containing a collective holder (12) with a plurality of sites (14) for receiving substrates to be processed. The device comprises a test sample (16), a light source (35) transmitting a light beam towards the test sample (16), and a sensor (18) for sensing the beam reflected therefrom. Said test sample (16) is arranged on an individual holder (20) which can be fitted in one of the sites (14) on the collective holder (12) and further jointly supports at least the insertable portion (21) of the sensor (18). The device is particularly suitable for providing anti-reflection coatings on lenses for spectacles.
机译:一种在处理室(11)中使用的装置,该装置包含具有多个位置(14)的集合保持器(12),用于接收待处理的基板。该装置包括测试样品(16),将光束朝着测试样品(16)传输的光源(35)和用于感测从其反射的光束的传感器(18)。所述测试样品(16)布置在单独的支架(20)上,该支架可以安装在集体支架(12)上的位置(14)之一中,并进一步共同支撑传感器( 18)。该装置特别适合在眼镜镜片上提供抗反射涂层。

著录项

  • 公开/公告号FR2719900A1

    专利类型

  • 公开/公告日1995-11-17

    原文格式PDF

  • 申请/专利权人 ESSILOR INTERNATIONAL;

    申请/专利号FR19940005793

  • 申请日1994-05-11

  • 分类号G01L1/00;G01B5/30;G01B7/16;G01B11/16;

  • 国家 FR

  • 入库时间 2022-08-22 03:40:35

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