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Method and device for in situ measurement of the stresses developing within a thin layer when it is deposited on a substrate.
Method and device for in situ measurement of the stresses developing within a thin layer when it is deposited on a substrate.
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机译:当薄层沉积在基板上时,用于原位测量在薄层内产生的应力的方法和装置。
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摘要
A device for use in a processing chamber (11) containing a collective holder (12) with a plurality of sites (14) for receiving substrates to be processed. The device comprises a test sample (16), a light source (35) transmitting a light beam towards the test sample (16), and a sensor (18) for sensing the beam reflected therefrom. Said test sample (16) is arranged on an individual holder (20) which can be fitted in one of the sites (14) on the collective holder (12) and further jointly supports at least the insertable portion (21) of the sensor (18). The device is particularly suitable for providing anti-reflection coatings on lenses for spectacles.
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