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Apparatus for and method of cleaning objects to be processed

机译:清洁待处理物体的设备和方法

摘要

A cleaning apparatus and a cleaning method for cleaning an object (W) are provided. In the cleaning apparatus, a drying chamber (42) and a cleaning bath (41) are separated from each other up and down, respectively. Thus, a space in the drying chamber (42) can be insulated from a space of the cleaning bath (41) through rotary doors (59a) and a slide door (72). In the cleaning method, a cleaning process in the cleaning bath (41) is carried out while sealing it by the rotary doors (59a). On the other hand, a drying process in the drying chamber (42) is accomplished while sealing and closing it by the slide door (72). Consequently, there is no possibility that, during the drying process, the object is subjected to a bad influence from a chemical treatment.
机译:提供一种用于清洁物体(W)的清洁设备和清洁方法。在该清洁装置中,干燥室(42)和清洁浴(41)分别上下分离。因此,能够通过旋转门59a和滑动门72将干燥室42内的空间与清洗槽41内的空间隔离。在该清洗方法中,在清洗槽41内进行清洗处理的同时,利用旋转门59a将其密封。另一方面,在干燥室42内的干燥过程中,通过滑动门72进行密封和关闭。因此,在干燥过程中,物体不可能受到化学处理的不利影响。

著录项

  • 公开/公告号EP0832697A3

    专利类型

  • 公开/公告日1999-09-22

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LIMITED;

    申请/专利号EP19970307593

  • 申请日1997-09-26

  • 分类号B08B3/08;H01L21/00;

  • 国家 EP

  • 入库时间 2022-08-22 02:19:49

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