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Single transverse mode short wavelength surface emitting semiconductor laser device and manufacturing method

机译:单横模短波长面发射半导体激光器装置及其制造方法

摘要

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gallium nitride (GaN) based light emitting semiconductor laser device, and in particular, an upper distributed Bragg reflector (DBR) 22 of a device is formed in the shape of a dome or a lens to polarize light. And a single transverse mode oscillation device that allows edge emitting devices to emit beams parallel to the stacking surface, whereas the surface emitting laser semiconductor beams are perpendicular to the stacking surface. ) Can be oscillated.;In the conventional surface light emitting diode, polarization is not fixed in a specific direction, but the present invention overcomes the above disadvantage by forming the upper DBR of the device in the shape of a lens.;The present invention also provides a method of manufacturing a single transverse mode short wavelength surface emitting semiconductor laser device as described above.;The manufacturing method of the present invention includes forming a convex lens-shaped PR pattern, applying heat to the pattern, and treating the device by dry etching.
机译:氮化镓基发光半导体激光器件技术领域本发明涉及一种基于氮化镓(GaN)的发光半导体激光器件,尤其是,器件的上部分布式布拉格反射器(DBR)22形成为以下形状:圆顶或透镜来偏振光。以及单个横向模式振荡装置,其允许边缘发射装置发射平行于堆叠表面的光束,而表面发射激光器半导体光束垂直于堆叠表面。在传统的表面发光二极管中,偏振不是在特定方向上固定的,但是本发明通过将器件的上DBR形成为透镜形状而克服了上述缺点。还提供了一种如上所述的制造单横模短波长表面发射半导体激光器的方法。本发明的制造方法包括形成凸透镜状的PR图案,对图案施加热量,并通过以下方法处理器件:干蚀刻。

著录项

  • 公开/公告号KR19980082621A

    专利类型

  • 公开/公告日1998-12-05

    原文格式PDF

  • 申请/专利权人 윤종용;

    申请/专利号KR19970017630

  • 发明设计人 김택;

    申请日1997-05-08

  • 分类号H01S3/00;

  • 国家 KR

  • 入库时间 2022-08-22 02:18:55

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