首页> 外国专利> Piping purge device of semiconductor device manufacturing equipment and its purging method and cleaning method of manufacturing equipment using these purge device and purging method

Piping purge device of semiconductor device manufacturing equipment and its purging method and cleaning method of manufacturing equipment using these purge device and purging method

机译:半导体器件制造设备的管道净化装置及其净化方法以及使用这些净化装置和净化方法的制造设备的净化方法

摘要

The present invention relates to a pipe purging device and a purge method of a semiconductor device manufacturing facility for preventing air, including particles and the like, from entering the piping of the manufacturing facility during maintenance, repair and cleaning of the semiconductor device manufacturing facility used in the manufacture of the semiconductor device. And a cleaning method of a manufacturing facility using these purge apparatuses and purge methods.;The pipe purge device of the semiconductor device manufacturing equipment according to the present invention includes a gas pipe 11, a mixing chamber 15, a reaction chamber 16 through which etching or deposition proceeds, a load lock chamber 17, and a main control valve 18. And at least one purge gas pipe 21 directly connected to the gas pipes 11, thereby purging the purge gas. Supplying the gas pipe 11 into the gas pipe 11 prevents the air containing particles and the like from entering the gas pipe 11 opened at atmospheric pressure, thereby preventing contamination of the gas pipe 11.
机译:半导体装置制造设备的管道清洗装置和清洗方法技术领域在半导体器件的制造中。以及使用这些吹扫设备和吹扫方法的制造设备的清洗方法。根据本发明的半导体器件制造设备的管道吹扫装置包括气体管11,混合室15,反应室16,通过蚀刻该反应室16当进行沉积或沉积时,负载锁定室17和主控制阀18。以及直接连接到气体管11的至少一个净化气体管21,从而净化净化气体。将气管11供应到气管11中可防止包含颗粒等的空气进入在大气压下打开的气管11中,从而防止了气管11的污染。

著录项

  • 公开/公告号KR19990004094A

    专利类型

  • 公开/公告日1999-01-15

    原文格式PDF

  • 申请/专利权人 윤종용;

    申请/专利号KR19970028096

  • 发明设计人 송병주;

    申请日1997-06-27

  • 分类号H01L21/02;

  • 国家 KR

  • 入库时间 2022-08-22 02:18:12

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