Dry etching devices for manufacturing semiconductor devices with shadow rings

摘要

A dry etching apparatus for manufacturing a semiconductor device having a shadow ring is disclosed. The dry etching apparatus according to the present invention includes a shadow ring installed around a pedestal supporting a wafer in an etching chamber to prevent reactive ions from escaping from inside the etching chamber into the pumping line. The shadow ring is detachably attached to the shadow ring on a first portion of the shadow ring and a shadow ring body comprising a first portion formed at a relatively thin thickness on the inner circumferential side and a second portion formed at a relatively thick thickness on the outer circumferential side. And a collar such that the height of the top surface is equal to the height of the top surface of the pedestal when coupled and mounted in the etching chamber in engagement with the shadow ring.