REGISTRATION AND ALIGNMENT TECHNIQUE FOR X-RAY MASK FABRICATION

摘要

The X-ray mask includes one or more X-ray transmissive mask windows and one or more pattern to mask alignment marks etched into the mask substrate from the same side as the mask window. Pattern to mask alignment marks may be etched simultaneously with the mask window and may be detected from the front surface of the mask substrate by an electron beam lithography system prior to generating the circuit pattern. Alignment marks are detected by the absence of backscattered electrons in the pattern mask alignment marks.