PHASE SHIFT MASK, METHOD OF MANUFACTURING A PHASE SHIFT MASK AND METHOD OF FORMING A PATTERN WITH PHASE SHIFT MASK

摘要

With a small number of masks, a hole pattern is formed with high precision at a fine pitch in the positive photoresist using a simple exposure apparatus.;A first light transmitting region, and the surface of the transparent substrate 1 is exposed in the Ta _1, a second light transmitting region, and in the Ta ₂ a semi-light-shielding film is formed on the surface of the transparent substrate 1, and the third light transmission The groove 1a is formed in the surface of the transparent substrate ₁ in the region Tn ₁ , and the semi-shielding film 3 and the phase shifter layer (on the surface of the transparent substrate 1 in the fourth light transmission region Ta ₂ ) 5) is laminated and formed, and in the light shielding area S, the semi-shielding film 3, the phase shifter layer 5, and the light shielding film 7 are laminated on the surface of the transparent substrate 1.