AlTi SERIES ALLOY SPUTTERING TARGET, WEAR RESISTANT AlTi SERIES ALLOY HARD FILM AND FORMATION OF THE FILM

摘要

PROBLEM TO BE SOLVED: To improve the hardness, oxidation resistance, adhesion with a base material or the like of a film formed on a cutting tool, a sliding member, a metal working tool or the like, to provide it with balanced characteristics, to execute stable film formation and to improve the service lives of the tools by allowing a sputtering target to have a specified compsn. ;SOLUTION: This AlTi series alloy sputtering target is the one having a compsn. of AlxTi1-x-y-zMyRz (where M denotes one or more kinds of elements selected from W and Mo, R denotes one or more kinds of rare earth elements selected from Y, Ce, La, misch metals or the like, and 0.05≤x≤0.7, 0.02≤y≤0.25, and 0.0005≤z≤0.05 are satisfied), the M moreover contains one or more kinds of elements selected from Si and Cr. The sputtering target can be produced by a melting method such as vacuum arc melting and plasma melting, and there is the need of melting in a vacuum or in an inert atmosphere. Moreover, it may also be produced by powder metallurgy in such a manner that Ti, Si and Al powders of prescribed particle sizes are mixed in prescribed ratio.;COPYRIGHT: (C)2000,JPO