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GaN-BASED SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND GaN- BASED SEMICONDUCTOR PHOTODETECTING ELEMENT

机译:GaN基半导体发光元件和GaN基光电检测元件

摘要

PROBLEM TO BE SOLVED: To obtain a GaN-based light-emitting element excellent in light emitting characteristic by improving the structure of a light leading-out side electrode, and obtain a GaN-based photodetecting element excellent in light receiving characteristic by improving the structure of a light-fetching side electrode.;SOLUTION: The forming pattern of upper electrodes P1 has a repetition part, where covered regions in which the upper surface of a contact layer S3 is covered the electrode P1 and exposed regions in which the upper surface of the layer 3 is not covered but exposed, are alternately arranged. In the repetition part, a width of the covered region is W, a width of the exposed region is G, a depth from the upper surface of the contact layer S3 to a light-emitting layer S2 is (d), refractive index of the contact layer is n1, and refractive index of the outside is n2. In this case, W≤10 μm, W≤2G, and G≤dxtanθ1 (where θ1=sin-1(n2/n1)) are satisfied. Furthermore, other various kinds of modes are imparted to the upper electrode.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:通过改善光引出侧电极的结构来获得发光特性优异的GaN基发光元件,并且通过改善结构来获得光接收特性优异的GaN基光电检测元件。解决方案:上电极P1的形成图案具有重复部分,其中覆盖层(其中接触层S3的上表面覆盖电极P1的覆盖区域)和暴露区域中的上电极P1的上表面覆盖。层3未被覆盖而是被暴露,被交替地布置。在重复部分中,被覆盖区域的宽度为W,被暴露区域的宽度为G,从接触层S3的上表面到发光层S2的深度为(d),其折射率接触层为n1,外部的折射率为n2。在这种情况下,满足W≤10μm,W≤2G和G≤dxtanθ1(其中θ1= sin-1(n2 / n1))。此外,还可以将其他各种模式赋予上电极。版权所有:(C)2000,JPO

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