METHOD OF MANUFACTURING OF SEMICONDUCTOR DEVICE WITH DEVELOPMENT PROCESS A USING WET SOLUTION

摘要

PURPOSE: A manufacturing method is provided to improve a uniformity of development and a linearity of photoresist pattern by moving a nozzle contain with a solution of development on a wafer. CONSTITUTION: The manufacturing method comprises the steps: forming a photoresist pattern on a wafer (4); exposing of the photoresist pattern; developing of the photoresist pattern using a nozzle (7) contain with development solution; and moving the nozzle (7) into the center. Thereby, it is possible to improve the uniformity and linearity of photoresist pattern in the development process.