Wet etching apparatus for semiconductor device manufacturing and etching solution circulating method in wet etching apparatus

摘要

The present invention relates to a wet etching apparatus for manufacturing a semiconductor device and a method for circulating an etchant in a wet etching apparatus that smoothes the circulation of the etching liquid and prevents the byproducts from etching from contacting the wafer during etching.;A wet etching apparatus for manufacturing a semiconductor device according to the present invention includes an inner bath 11 in which a wafer to be etched is received, an outer bath 12 connected to the upper side of the inner bath 11, A circulation pipe 13 connected to the upper part of the inner tank 11 to circulate the etching solution through the circulation pipe 12 and a pump 14 mounted on the circulation pipe 13 for circulating the etching solution.;Therefore, according to the present invention, it is possible to prevent re-contamination of the wafer during the etching process by particles or the like which may be generated during the etching process.