Dynamic compensation of induction effects in electron optical devices especially for electron beam lithography using raster microscopes

摘要

The method includes measuring the dynamic behavior of a device and controlling the movement using the measured parameter, with addressed beam movement along a calculated virtual track. The method of dynamic compensation involves first measuring the individual dynamic behavior of a device. The movement is then controlled using the measured parameter such that the desired movement is precisely achieved. The control is a speed dependent digitally address control. The beam should, after it has suddenly moved from another position, run with constant speed on the horizontal line (1). If the beam movement along the line is addressed, then a curved course results which never meets the line. It is thus necessary to address the beam along a calculated virtual track (5) so that it effectively runs along the line.