Insulating film, used as a dielectric layer in a thin film electroluminescent display device on an alkali metal-free glass substrate, comprises an aluminum oxide-rich arrangement of alternating aluminum oxide and titanium oxide layers

摘要

An insulating film of a thin film structure on an alkali metal-free glass substrate comprises an aluminum oxide-rich arrangement of alternating aluminum oxide and titanium oxide layers. An insulating film of a thin film structure deposited on an alkali metal-free glass substrate comprises alternating layers of aluminum oxide and titanium oxide. The ratio of the cumulative thicknesses of the titanium oxide and aluminum oxide layers are less than 0.75. An Independent claim is also included for an electroluminescent thin film display device comprising an alkali metal-free glass substrate bearing two electrode layers which are separated by a phosphor layer sandwiched between dielectric layers having the above described structure.