mehrsäulen - electron beam lithography system

摘要

PROBLEM TO BE SOLVED: To provide an inexpensive multi-column electron beam exposure device capable of concurrently exposing chips on one wafer. ;SOLUTION: This electron beam exposure device concurrently exposing patterns on one wafer has a primary deflector 16 having a large deflection, a secondary deflector 14 having a small deflection, and plural columns deflecting and irradiating electron beams on samples, according to primary deflector data 62 and secondary deflector data 61. This device is also provided with a deviation memory 63 storing the previously measured deviations of optical axes of respective columns, and a correcting means 64 correcting only the primary deflector data 62 of every column according to the deviations of the optical axes of the respective columns. And the device exposes the same patterns at the same time.;COPYRIGHT: (C)1999,JPO