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through topology induced increase in research to improve the etching uniformity
through topology induced increase in research to improve the etching uniformity
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机译:通过拓扑诱导增加研究以提高蚀刻均匀性
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摘要
A plasma discharge electrode having a front surface with a central portion thereof including outlets for discharging reactant gas which forms a plasma and a peripheral portion substantially surrounding the outlets. The peripheral portion has at least one recess for locally enhancing a density of the plasma formed by the electrode. The recess can be formed in a replaceable insert and the electrode can be made from a single crystal of silicon.
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