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Hole impact ionization mechanism of hot electron injection and four- terminal FET semiconductor structure for long-term learning

机译:热电子注入的空穴碰撞电离机理和用于长期学习的四端FET半导体结构

摘要

Hot-electron injection driven by a hole impact ionization mechanism at the channel-drain junction provides a new method of hot electron injection. Using this mechanism, a four-terminal pFET floating- gate silicon MOS transistor for analog learning applications provides nonvolatile memory storage. Electron tunneling permits bidirectional memory updates. Because these updates depend on both the stored memory value and the transistor terminal voltages, the synapses can implement a learning function. The synapse learning follows a simple power law. Unlike conventional EEPROMs, the synapses allow simultaneous memory reading and writing. Synapse transistor arrays can therefore compute both the array output, and local memory updates, in parallel. Synaptic arrays employing these devices enjoy write and erase isolation between array synapses is better than 0.01% because the tunneling and injection processes are exponential in the transistor terminal voltages. The synapses are small, and typically are operated at subthreshold current levels.
机译:在沟道-漏极结处由空穴碰撞电离机制驱动的热电子注入提供了一种新的热电子注入方法。使用这种机制,用于模拟学习应用的四端pFET浮栅硅MOS晶体管可提供非易失性存储器存储。电子隧穿允许双向存储器更新。因为这些更新取决于存储的存储值和晶体管端子电压,所以突触可以实现学习功能。突触学习遵循简单的幂定律。与传统的EEPROM不同,突触允许同时读取和写入存储器。因此,突触晶体管阵列可以并行计算阵列输出和本地存储器更新。采用这些器件的突触阵列在阵列突触之间享有的写和擦除隔离度优于0.01%,因为隧穿和注入过程在晶体管端电压上是指数级的。突触很小,通常在亚阈值电流水平下操作。

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